TECH OFFER

A Method of Tuning an Indium tin oxide (ITO) Work Function.

TECHNOLOGY OVERVIEW

The present invention relates to a method of tuning an indium tin oxide (ITO) for hole injection in semiconductors, characterised by the steps of: dissolving cesium fluoride (CsF) in a deionised water at a concentration between 2-50 mg/L; coating the CsF solution on surface of a clean ITO glass; heating the coated ITO glass at temperature in a range of 85-150?C; cleaning the coated ITO glass with deionised water to remove cesium and residues; and drying the coated ITO glass to obtain the tuned ITO having a smoother ITO surface.

Mega - Trends

Energy and Power, Environment and Water, Chemicals and Materials

Technology Readiness Level (TRL)

TRL 3

Patent Number

PI 2014700191

Get the technology fact sheet here:

Contact person for this offer:

ChM Dr. Lee Ching Shya, PhD (Dual), RTTP

Technology Transfer Manager

Email: leecs@um.edu.my

Tel: +603-7967-7351/ 013-2250151

MAKE AN ENQUIRY

press to zoom

press to zoom
1/1

MORE INFORMATION

You have a question to know about technologies or cooperations? 
Please Contact Us:

+603 - 7967 7351 / 013-2250151