TECH OFFER

A Powder-Based Target Physical Vapor Deposition Apparatus

TECHNOLOGY OVERVIEW

The present invention relates to a physical vapour deposition apparatus for depositing substantially uniform coatings on a substrate, comprising: a deposition chamber; a rotary shaft disposed at centre of said deposition chamber; a substrate holder coupled to the rotary shaft, for holding the substrate; a heater coupled to the rotary shaft above the substrate holder, for heating the substrate; a magnetron assembly for sputtering of electron ions on a deposit; a pump, for generating and providing a vacuum-like atmosphere in the physical vapour deposition apparatus; and characterised by: a shutter positioned above the magnetron assembly for controlling exposure of a coating material to an ion bombardment; the magnetron assembly comprises of a first magnet stack positioned in centre of said magnetron assembly; a second magnet stack positioned at periphery of said magnetron for enhancing electrons during deposition; a cooling block; an insulator; and a power supply means.

Mega - Trends

New Trade Zones, Future of Consumer Electronics, Innovative Technologies of the Future, Energy and Power, Automotive, Aerospace and Defence

Technology Readiness Level (TRL)

TRL 7

Patent Number

MY-175715-A

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Contact person for this offer:

ChM Dr. Lee Ching Shya, PhD (Dual), RTTP

Technology Transfer Manager

Email: leecs@um.edu.my

Tel: +603-7967-7351/ 013-2250151

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