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TAWARAN TEKNIK

A Powder-Based Target Physical Vapor Deposition Apparatus

TINJAUAN TEKNOLOGI

The present invention relates to a physical vapour deposition apparatus for depositing substantially uniform coatings on a substrate, comprising: a deposition chamber; a rotary shaft disposed at centre of said deposition chamber; a substrate holder coupled to the rotary shaft, for holding the substrate; a heater coupled to the rotary shaft above the substrate holder, for heating the substrate; a magnetron assembly for sputtering of electron ions on a deposit; a pump, for generating and providing a vacuum-like atmosphere in the physical vapour deposition apparatus; and characterised by: a shutter positioned above the magnetron assembly for controlling exposure of a coating material to an ion bombardment; the magnetron assembly comprises of a first magnet stack positioned in centre of said magnetron assembly; a second magnet stack positioned at periphery of said magnetron for enhancing electrons during deposition; a cooling block; an insulator; and a power supply means.

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New Trade Zones, Future of Consumer Electronics, Innovative Technologies of the Future, Energy and Power, Automotive, Aerospace and Defence

Tahap Kesediaan Teknologi (TRL)

TRL 7

Nombor Paten

MY-175715-A

Dapatkan helaian fakta teknologi di sini:

Orang yang boleh dihubungi untuk tawaran ini:

Lee Ching Shya

Pegawai Perniagaan UMCIC Universiti Malaya

e-mel:  leecs@um.edu.my

Tel: +603-7967-7351/7352

MAKLUMAT LANJUT

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+603 - 7967 7351

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